DocumentCode :
1586640
Title :
Chemical metallization of ceramic substrates-an alternative to thick and thin film technology
Author :
Feil, Michael
Author_Institution :
Fraunhofer-Inst. for Solid State Technol., Munich, West Germany
fYear :
1988
Firstpage :
106
Lastpage :
111
Abstract :
The material properties of chemically deposited copper and patterning techniques are described. This is followed by a depiction of the RF capability and important mechanical properties such as adhesive strength, solderability, and bondability. Starting points for the integration of resistors and multilayer metallizations are suggested. An example for practical application is given.<>
Keywords :
ceramics; integrated circuit technology; metallisation; RF capability; adhesive strength; bondability; ceramic substrates; metallization; multilayer metallizations; patterning techniques; resistors; solderability; Adhesive strength; Bonding; Ceramics; Chemicals; Copper; Material properties; Mechanical factors; Metallization; Radio frequency; Resistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Manufacturing Technology Symposium, 1988, Design-to-Manufacturing Transfer Cycle. Fifth IEEE/CHMT International
Conference_Location :
Lake Buena Vista, FL, USA
Type :
conf
DOI :
10.1109/EMTS.1988.16159
Filename :
16159
Link To Document :
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