• DocumentCode
    1587348
  • Title

    New delay model for 0.5μ CMOS ASIC

  • Author

    Gerousis, Vassilios ; Nghiem Pan ; Weaver, Dave

  • Author_Institution
    ASIC Div., Motorola, Inc., Chandler, AZ, USA
  • fYear
    1993
  • Firstpage
    511
  • Lastpage
    514
  • Abstract
    As silicon geometry moves closer to deep sub-micron (smaller than 0.5-μm) technology, new physical phenomena start to appear and dominate the delay through an ASIC cell. As delays become smaller and the overall performance of applications increase, the emphasis on delay calculation accuracy increases. The authors demonstrate 0.5-μm CMOS delay related physical phenomena such as coupling and shielding effects. They show how these components affect the cell and interconnect delays. The effects of these physical phenomena on CAD technology are discussed. A delay model for 0.5-μm CMOS ASIC technology is described. This model takes into consideration the following items: unique 0.5-micron physical phenomena; optimization of ASIC library cell characterization time; speed of delay calculator CAD tool; the requirement of interconnect extraction and calculation accuracy; and the extensibility and flexibility of the model to provide additional accuracy for future silicon technology
  • Keywords
    CMOS logic circuits; SPICE; application specific integrated circuits; cellular arrays; circuit analysis computing; delays; integrated circuit interconnections; integrated circuit modelling; logic CAD; 0.5 micron; ASIC library cell characterization time; CAD technology; CMOS ASIC; SPICE; coupling effects; delay model; interconnect delays; interconnect extraction; macrocell; mesh table; optimization; shielding effects; Accuracy; Application specific integrated circuits; CMOS technology; Delay effects; Geometry; Polynomials; Propagation delay; Routing; Semiconductor device modeling; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    ASIC Conference and Exhibit, 1993. Proceedings., Sixth Annual IEEE International
  • Conference_Location
    Rochester, NY
  • Print_ISBN
    0-7803-1375-5
  • Type

    conf

  • DOI
    10.1109/ASIC.1993.410770
  • Filename
    410770