DocumentCode :
158737
Title :
Influence of a thin dielectric film on electrical insulation in vacuum gaps at the pulse voltage
Author :
Onischenko, S.A. ; Nefyodtsev, E.V. ; Batrakov, A.V. ; Proskurovsky, D.I.
Author_Institution :
SB, Inst. of High Current Electron., Tomsk, Russia
fYear :
2014
fDate :
Sept. 28 2014-Oct. 3 2014
Firstpage :
49
Lastpage :
51
Abstract :
The influence of thin (0.15 μm) dielectric films TiO2, coating by anodization, on the pulsed electric strength of vacuum gaps with titanium electrodes was investigated. As a benchmark for comparison was the value of ~ 1.6 MV/cm of electric strength of the vacuum gap with titanium electrodes after pulsed melting of the surface by electron beam. We also give results on the measurement of electrical strength of vacuum gap after complex treatment of electrodes (surface remelting followed by coating of the oxide).
Keywords :
anodisation; electron beams; titanium; titanium compounds; vacuum insulation; TiO2; size 0.15 mum; Coatings; Dielectric films; Discharges (electric); Electrodes; Insulation; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Discharges and Electrical Insulation in Vacuum (ISDEIV), 2014 International Symposium on
Conference_Location :
Mumbai
Print_ISBN :
978-1-4799-6750-6
Type :
conf
DOI :
10.1109/DEIV.2014.6961616
Filename :
6961616
Link To Document :
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