DocumentCode
1589954
Title
The Ultimate Drift Velocity in Two Dimensional Quantum Limit
Author
Ahmadi, Mohammad Taghi ; Saad, Ismail ; Ismail, Razali ; Arora, Vijay K.
Author_Institution
Fac. of Electr. Eng., Univ. Technol. of Malaysia, Johor Bahru
fYear
2008
Firstpage
980
Lastpage
984
Abstract
In a conventional MOSFET, carriers are confined in a direction normal to the channel, and free to move in two dimensions. It is, however, now with nanotubes possible to make structures that confine carriers in two dimensions, so that they are free to move only in one direction. The nanowires and nanotubes are being considered as best candidates for high-speed applications because of the high mobility due to the suppression of the ionized impurity scattering especially at low temperatures. It is shown that the high mobility does not always lead to higher carrier velocity. Using the distribution function that takes into account the asymmetrical distribution of drifting electrons in an electric field is presented .This distribution function transforms the random motion of electrons into a streamlined one that gives the ultimate saturation velocity that is a function of temperature in nondegenerate regime and a function of carrier concentration in the degenerate regime The ultimate drift velocity is found to be appropriate thermal velocity for a given dimensionality for nondegenerately doped samples. However, the ultimate drift velocity is the appropriate average of the Fermi velocity for degenerately doped samples.
Keywords
MOSFET; nanotubes; statistical distributions; MOSFET; asymmetrical distribution; carrier concentration; carriers; distribution function; drifting electrons; electrons random motion; ionized impurity scattering; nanotubes; two dimensional quantum limit; ultimate drift velocity; Asia; Carrier confinement; Charge carrier processes; Distribution functions; Electron mobility; MOSFET circuits; Nanotubes; Particle scattering; Silicon; Temperature; Fermi velocity; Quantum limit; Ultimate drift velocity;
fLanguage
English
Publisher
ieee
Conference_Titel
Modeling & Simulation, 2008. AICMS 08. Second Asia International Conference on
Conference_Location
Kuala Lumpur
Print_ISBN
978-0-7695-3136-6
Electronic_ISBN
978-0-7695-3136-6
Type
conf
DOI
10.1109/AMS.2008.53
Filename
4530609
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