Micro processing by intense fast electron beam

Generation of intense electron beams by superposing two discharges, namely a low pressure DC glow discharge and a high current pulsed discharge at pressures and voltages very similar to that of the pseudo-spark gap devices, has been reported previously. The small diameter, high peak current and short pulse length are the characteristics of the electron beam generated using this technique. In this technique, no high vacuum facilities are necessary, and many applications such as micro processing, X-rays generation, preionization for high-power lasers are feasible. The electron beam current is in the range of 10-30 A. A full characterization of the electron beam that is utilized in this work has been given in a previous work. In this work it is reported that the most energetic part of the electron beam is about 5-nanosecond pulse duration. The beam is magnetically deflected to the specific point.