• DocumentCode
    1591292
  • Title

    High current, high temperature capacitors: Recent developments and future prospects

  • Author

    Schneider, Mark Allen ; Schalnat, Matthew C. ; Macdonald, John R. ; Doty, Samuel ; Bagdy, Esteban ; Keller, Nathan ; Ennis, Joel B.

  • Author_Institution
    Gen. Atomics Electron. Syst., Inc., San Diego, CA, USA
  • fYear
    2013
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. There is a significant need for high temperature capacitors for a variety of operating conditions including pulse power, and high frequency power conditioning applications at temperatures between 125°C and 200°C. Here we cover several new developments in high temperature capacitor technologies presenting results on thin film capacitors useful for long life, high energy density, and high reliability. Additionally, results are presented on an improved very-high temperature film (200°C and higher) with more reliable self-healing, longer lifetime, and higher energy densities. Results from metallized film capacitors with improved termination demonstrating drastic improvements in current carrying capabilities in both CW RMS current and peak pulse current regimes are also presented. Finally, a theoretical high temperature capacitor utilizing a combination of these technologies is discussed and compared to existing COTS and SOTA capacitors.
  • Keywords
    power capacitors; pulsed power supplies; thin film capacitors; frequency power conditioning applications; high current capacitors; high energy density; high reliability; high temperature capacitors; metallized film capacitors; pulse power; temperature 125 degC to 200 degC; thin film capacitors; Atomic clocks; Capacitors; Films; Green products; Laboratories; Power conditioning; Reliability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
  • Conference_Location
    San Francisco, CA
  • ISSN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2013.6634795
  • Filename
    6634795