DocumentCode :
159303
Title :
Optical isolator with amorphous silicon waveguide core on magneto-optical garnet
Author :
Miura, Kiyotaka ; Hirasawa, T. ; Kang, Jiawen ; Shoji, Yozo ; Okada, Yoshitaka ; Yokoi, Hiroshi ; Nishiyama, Naoto ; Arai, Shigehisa ; Mizumoto, Tetsuya
Author_Institution :
Dept. of Electr. & Electron. Eng., Tokyo Inst. of Technol., Tokyo, Japan
fYear :
2014
fDate :
27-29 Aug. 2014
Firstpage :
116
Lastpage :
117
Abstract :
An optical isolator is fabricated with an amorphous silicon waveguide core deposited using a plasma-enhanced chemical-vapor-deposition technique on a magneto-optical garnet Ce:YIG. An isolation ratio of 17 dB is demonstrated.
Keywords :
amorphous semiconductors; cerium; elemental semiconductors; garnets; magneto-optical isolators; optical fabrication; optical waveguides; plasma CVD; silicon; yttrium compounds; Si-Y3IG; amorphous silicon waveguide core; isolation ratio; magneto-optical garnet; optical isolator; plasma-enhanced chemical-vapor-deposition technique; Isolators; Magnetooptic effects; Optical amplifiers; Optical device fabrication; Optical feedback; Optical interferometry; Optical waveguides;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Group IV Photonics (GFP), 2014 IEEE 11th International Conference on
Conference_Location :
Paris
Print_ISBN :
978-1-4799-2282-6
Type :
conf
DOI :
10.1109/Group4.2014.6961954
Filename :
6961954
Link To Document :
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