DocumentCode :
1593123
Title :
Retention modeling of nanocrystalline flash memories: A Monte Carlo approach
Author :
Ghosh, Bahniman ; Liu, Hai ; Winstead, Brian ; Foisy, Mark C. ; Banerjee, Sanjay K.
Author_Institution :
Indian Inst. of Technol., Kanpur, India
fYear :
2010
Firstpage :
203
Lastpage :
205
Abstract :
In this work we perform a study of the data retention behavior of silicon nanocrystalline flash memories. Charge loss is modeled through direct and trap assisted tunneling from the nanocrystals to the channel and to the neighboring nanocrystals. The discrete loss of charge is modeled by a Monte Carlo algorithm. In addition to being more realistic, the Monte Carlo approach, can inherently take into account statistical fluctuations among different memory devices and the effect becomes more important as the devices are scaled down in size. The simulated charge retention data has been fitted to experimental data and show reasonable agreement for various temperatures and oxide thicknesses.
Keywords :
Monte Carlo methods; elemental semiconductors; flash memories; semiconductor device models; silicon; tunnelling; Monte Carlo approach; Si; data retention behavior; discrete loss of charge; neighboring nanocrystals; silicon nanocrystalline flash memories; simulated charge retention data modelling; statistical fluctuations; trap assisted tunneling; Flash memory; Monte Carlo methods; Memory; Monte Carlo; Nanocrystal; Silicon; Traps;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Electronics (ICSE), 2010 IEEE International Conference on
Conference_Location :
Melaka
Print_ISBN :
978-1-4244-6608-5
Type :
conf
DOI :
10.1109/SMELEC.2010.5549551
Filename :
5549551
Link To Document :
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