DocumentCode
1593495
Title
Capacitor over Bitline (COB) DRAM Cell and its Contributions to High Density DRAMs
Author
Kimura, Shin´ichiro
Author_Institution
Central Res. Lab., Hitachi Ltd., Tokyo
fYear
2008
Firstpage
79
Lastpage
80
Abstract
The capacitor over bitline (COB) cell has significantly contributed to the increase of DRAM density. A simple idea of making capacitors over bitlines changed the memory cell structure and fabrication steps, and enabled the cell to maintain sufficient storage capacitance in ever decreasing memory cell. The COB cell has been proved to be the most suitable DRAM cell structure for this decade. In this presentation, I would like to review the COB cell development and its contributions to the high density DRAMs. Outlook on future cell structures based on the COB cell will also be discussed.
Keywords
DRAM chips; capacitors; DRAM density; capacitor over bitline DRAM cell; fabrication steps; memory cell structure; storage capacitance; Capacitance; Capacitors; Dielectrics; Electrodes; Fabrication; Hafnium oxide; Joining processes; Laboratories; Random access memory; Silicon compounds;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, Systems and Applications, 2008. VLSI-TSA 2008. International Symposium on
Conference_Location
Hsinchu
ISSN
1524-766X
Print_ISBN
978-1-4244-1614-1
Electronic_ISBN
1524-766X
Type
conf
DOI
10.1109/VTSA.2008.4530807
Filename
4530807
Link To Document