• DocumentCode
    1593495
  • Title

    Capacitor over Bitline (COB) DRAM Cell and its Contributions to High Density DRAMs

  • Author

    Kimura, Shin´ichiro

  • Author_Institution
    Central Res. Lab., Hitachi Ltd., Tokyo
  • fYear
    2008
  • Firstpage
    79
  • Lastpage
    80
  • Abstract
    The capacitor over bitline (COB) cell has significantly contributed to the increase of DRAM density. A simple idea of making capacitors over bitlines changed the memory cell structure and fabrication steps, and enabled the cell to maintain sufficient storage capacitance in ever decreasing memory cell. The COB cell has been proved to be the most suitable DRAM cell structure for this decade. In this presentation, I would like to review the COB cell development and its contributions to the high density DRAMs. Outlook on future cell structures based on the COB cell will also be discussed.
  • Keywords
    DRAM chips; capacitors; DRAM density; capacitor over bitline DRAM cell; fabrication steps; memory cell structure; storage capacitance; Capacitance; Capacitors; Dielectrics; Electrodes; Fabrication; Hafnium oxide; Joining processes; Laboratories; Random access memory; Silicon compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, Systems and Applications, 2008. VLSI-TSA 2008. International Symposium on
  • Conference_Location
    Hsinchu
  • ISSN
    1524-766X
  • Print_ISBN
    978-1-4244-1614-1
  • Electronic_ISBN
    1524-766X
  • Type

    conf

  • DOI
    10.1109/VTSA.2008.4530807
  • Filename
    4530807