Strained FinFETs with In-situ Doped Si1-yCy Source and Drain Stressors: Performance Boost with Lateral Stressor Encroachment and High Substitutional Carbon Content

In this paper, we report the first demonstration of n-channel FinFETs with in-situ doped silicon-carbon (Si_1-yC_y or SiC:P) source and drain (S/D) stressors. New key features incorporated in this work for performance enhancement includes record-high substitutional carbon concentration C_sub of 2.1%, high in-situ phosphorus doping concentration in S/D, extended Pi -shaped S/D stressors that wrap around the Si fin for maximum lattice interaction, lateral stressor encroachment under the spacer for closer promixity to channel region for maximum channel stress as well as reduced S/D extension resistances.