DocumentCode :
159418
Title :
High-efficiency subwavelength-engineered surface grating couplers in SOI and DSOI
Author :
Benedikovic, Daniel ; Cheben, Pavel ; Schmid, Jens H. ; Xu, Dan-Xia ; Wang, Shuhui ; Janz, Siegfried ; Halir, Robert ; Ortega-Monux, A. ; Dado, Milan
Author_Institution :
Dept. of Telecommun. & Multimedia, Univ. of Zilina, Žilina, Slovakia
fYear :
2014
fDate :
27-29 Aug. 2014
Firstpage :
41
Lastpage :
42
Abstract :
The coupling efficiency of a surface grating coupler is optimized for a an arbitrary buried oxide thickness by adjusting the grating radiation angle. The coupler is apodized using a subwavelength structure, allowing a single etch step fabrication. The measured coupling loss is -2.16dB with 3dB bandwidth of 64nm, for a minimum feature size of 100nm. It is also shown by simulations that by implementing this coupler in a double SOI (DSOI) wafer, an ultra-low coupling loss of -0.42dB is achieved.
Keywords :
diffraction gratings; etching; integrated optoelectronics; optical couplers; optical fabrication; optical losses; silicon-on-insulator; DSOI; Si; arbitrary buried oxide thickness; coupling efficiency; coupling loss; double SOI wafer; grating radiation angle; high-efficiency subwavelength-engineered surface grating couplers; single etch step fabrication; subwavelength structure; Couplers; Couplings; Fiber gratings; Gratings; Optical surface waves; Optical waveguides; Silicon; fiber-to-chip grating coupler; integrated optics; silicon-on-insulator (SOI); subwavelength grating (SWG);
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Group IV Photonics (GFP), 2014 IEEE 11th International Conference on
Conference_Location :
Paris
Print_ISBN :
978-1-4799-2282-6
Type :
conf
DOI :
10.1109/Group4.2014.6962018
Filename :
6962018
Link To Document :
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