• DocumentCode
    159423
  • Title

    Temperature-insensitive silicon ring fabricated by DUV lithography and overlaid with highly negative thermo-optic TiO2

  • Author

    Jong Moo Lee

  • Author_Institution
    ETRI, Daejeon, South Korea
  • fYear
    2014
  • fDate
    27-29 Aug. 2014
  • Firstpage
    67
  • Lastpage
    68
  • Abstract
    Temperature-dependent spectral variations of 5 μm-radius silicon ring resonators, which are fabricated by deep ultra-violet (DUV) lithography and overlaid by air, silica and highly negative thermo-optic TiO2, respectively, are compared by experiment.
  • Keywords
    elemental semiconductors; integrated optics; optical fabrication; optical resonators; silicon; silicon compounds; thermo-optical devices; thermo-optical effects; titanium compounds; ultraviolet lithography; DUV lithography; Si-SiO2-TiO2; deep ultraviolet lithography; negative thermo-optic cladding; radius 5 mum; temperature-dependent spectral variations; temperature-insensitive silicon ring resonators; Lithography; Optical ring resonators; Optimized production technology; Polymers; Silicon; Temperature measurement; Ultraviolet sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Group IV Photonics (GFP), 2014 IEEE 11th International Conference on
  • Conference_Location
    Paris
  • Print_ISBN
    978-1-4799-2282-6
  • Type

    conf

  • DOI
    10.1109/Group4.2014.6962023
  • Filename
    6962023
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=159423