Title :
Application of perfluorocarbon liquids for a-C:F film production on electrodes by plasma enhanced chemical vapor deposition
Author :
Sakai, Y. ; Tazawa, S. ; Bratescu, M.-A. ; Suda, Y. ; Sugawra, H.
Author_Institution :
Graduate Sch. of Inf. Sci. & Technol., Hokkaido Univ., Sapporo, Japan
Abstract :
Application of dielectric liquids for production of thin films on substrates was presented. In our studies, taking a perfluorooctane C8F18 monomer liquid, an amorphous fluorocarbon thin film (a-C:F) was deposited on substrates in radio-frequency C8F18 vapor plasma. The decomposed species in the plasma were observed as C, C2, CF, CF2 and CF3. The chemical and electrical properties of a-C:F films were examined. The breakdown voltage (Vs) of N2, Ar and He gases between the a-C:F film coated Al sphere-sphere electrodes for a gas pressure (p) times gap length (d), 0.1-100 Torr cm, was measured. It was found that the a-C:F film coated electrodes enhanced Vs values by a several times higher than the Al electrode case.
Keywords :
aluminium; amorphous state; carbon; dielectric liquids; electric breakdown; electrodes; fluorine; plasma CVD; Al; C:F; amorphous fluorocarbon thin film; breakdown voltage; dielectric liquids; film coated electrodes; film production; gap length; gas pressure; perfluorocarbon liquids; plasma enhanced chemical vapor deposition; radio-frequency C8F18 vapor plasma; Amorphous materials; Chemical vapor deposition; Dielectric liquids; Dielectric substrates; Dielectric thin films; Electrodes; Plasma applications; Plasma chemistry; Plasma properties; Production;
Conference_Titel :
Dielectric Liquids, 2005. ICDL 2005. 2005 IEEE International Conference on
Print_ISBN :
0-7803-8954-9
DOI :
10.1109/ICDL.2005.1490115
