DocumentCode :
1595737
Title :
Kinetic simulations of a large-sized multifrequency CCP-based sputtering source with a PIC/MCC darwin code
Author :
Eremin, Denis ; Bienholz, Stefan ; Szeremley, Daniel ; Hemke, Torben ; Awakowicz, Peter ; Brinkmann, Ralf Peter ; Mussenbrock, Thomas
Author_Institution :
Ruhr Univ. Bochum, Bochum, Germany
fYear :
2013
Firstpage :
1
Lastpage :
1
Abstract :
Summary form only given. A novel concept of a sputtering source based on a CCP multifrequency large-sized discharge is currently under experimental investigation [1]. The physics of such a discharge is quite complex and includes phenomena taking place on several time and spatial scales. In particular, because of the size and the high frequency harmonics in the driving voltage of such a discharge, the electromagnetic effects may play a significant role. Moreover, use of the electrical asymmetry effect (EAE) to create a self-consistent bias complicates the problem even more. In the present work we report results of our studying such a discharge with a recently developed self-consistent kinetic 2d3c PIC/MCC GPU-parallelized code which uses Darwin approximation [2] for description of the electromagnetic field components. The simulations are made in a geometry close to that of the sputtering source used in the experiments. We discuss interesting features of the discharges arising in the main and the side chambers and compare the simulation results and the experimental data.
Keywords :
Monte Carlo methods; graphics processing units; high-frequency discharges; physics computing; plasma kinetic theory; plasma simulation; plasma sources; sputtering; CCP mutifrequency large-sized discharge; Darwin approximation; EAE; PIC/MCC darwin code; driving voltage; electrical asymmetry effect; electromagnetic field component; high frequency harmonics; kinetic simulations; large-sized multifrequency CCP-based sputtering source; main chambers; self-consistent bias; self-consistent kinetic 2d3c PIC/MCC GPU-parallelized code; side chambers; spatial scale; time scale; Discharges (electric); Electromagnetics; Fault location; Kinetic theory; Sputtering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
Conference_Location :
San Francisco, CA
ISSN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2013.6634962
Filename :
6634962
Link To Document :
بازگشت