DocumentCode
1596175
Title
Development and characterization of a pulsed micro hollow cathode discharge array
Author
Stephens, J. ; Loya, B. ; Dickens, J. ; Neuber, A.
Author_Institution
Center for Pulsed Power & Power Electron., Texas Tech Univ., Lubbock, TX, USA
fYear
2013
Firstpage
1
Lastpage
1
Abstract
Summary form only given. A high side, high voltage pulser is used to excite a micro hollow cathode discharge (MHCD) geometry with short pulsed voltages adjustable on the order of 100-500 ns, at repetition rates from 10-200 kHz. The goal of this research is to develop an intense, efficient UV/VUV radiation source capable of generating photons of sufficient energy to affect direct photo-ionization in a gaseous volume rather than photoemission from surfaces. The pulser used in this study has experimentally demonstrated to be capable of efficiencies on the order of 80% when delivering power to a 1 KΩ resistive load at 200 kHz repetition rate. The final design is to be compact, and robust, capable of long term rep-rated operation with minimal electrode erosion and dielectric degradation. Present designs involve laser machining a direct bonded copper (DBC) substrate consisting of Cu-Al2O3-Cu. Transient ignition of the MHCD, voltage and current waveforms, and spectral emission are all experimentally studied. A transient, 2-dimensional, cylindrical coordinate (r-z) fluid model is used for the theoretical treatment of the microdischarge. Using known rate coefficients for argon, time and space resolved behavior of discharge under pulsed conditions is presented.
Keywords
electrodes; glow discharges; laser beam machining; photoemission; photoionisation; plasma simulation; plasma sources; plasma transport processes; 2-dimensional fluid model; Cu-Al2O3-Cu; UV-VUV radiation source; current waveforms; cylindrical coordinate fluid model; dielectric degradation; direct bonded copper substrate; electrode erosion; frequency 100 kHz to 200 kHz; high voltage pulser; laser machining; photo-ionization; pulsed conditions; pulsed micro hollow cathode discharge array; rate coefficients; rep-rated operation; repetition rates; resistive load; space resolved behavior; spectral emission; time 100 ns to 500 ns; time resolved behavior; transient fluid model; voltage waveforms; Arrays; Cathodes; Discharges (electric); Educational institutions; Fault diagnosis; Power electronics; Transient analysis;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
Conference_Location
San Francisco, CA
ISSN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2013.6634980
Filename
6634980
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