Title :
Development and characterization of a pulsed micro hollow cathode discharge array
Author :
Stephens, J. ; Loya, B. ; Dickens, J. ; Neuber, A.
Author_Institution :
Center for Pulsed Power & Power Electron., Texas Tech Univ., Lubbock, TX, USA
Abstract :
Summary form only given. A high side, high voltage pulser is used to excite a micro hollow cathode discharge (MHCD) geometry with short pulsed voltages adjustable on the order of 100-500 ns, at repetition rates from 10-200 kHz. The goal of this research is to develop an intense, efficient UV/VUV radiation source capable of generating photons of sufficient energy to affect direct photo-ionization in a gaseous volume rather than photoemission from surfaces. The pulser used in this study has experimentally demonstrated to be capable of efficiencies on the order of 80% when delivering power to a 1 KΩ resistive load at 200 kHz repetition rate. The final design is to be compact, and robust, capable of long term rep-rated operation with minimal electrode erosion and dielectric degradation. Present designs involve laser machining a direct bonded copper (DBC) substrate consisting of Cu-Al2O3-Cu. Transient ignition of the MHCD, voltage and current waveforms, and spectral emission are all experimentally studied. A transient, 2-dimensional, cylindrical coordinate (r-z) fluid model is used for the theoretical treatment of the microdischarge. Using known rate coefficients for argon, time and space resolved behavior of discharge under pulsed conditions is presented.
Keywords :
electrodes; glow discharges; laser beam machining; photoemission; photoionisation; plasma simulation; plasma sources; plasma transport processes; 2-dimensional fluid model; Cu-Al2O3-Cu; UV-VUV radiation source; current waveforms; cylindrical coordinate fluid model; dielectric degradation; direct bonded copper substrate; electrode erosion; frequency 100 kHz to 200 kHz; high voltage pulser; laser machining; photo-ionization; pulsed conditions; pulsed micro hollow cathode discharge array; rate coefficients; rep-rated operation; repetition rates; resistive load; space resolved behavior; spectral emission; time 100 ns to 500 ns; time resolved behavior; transient fluid model; voltage waveforms; Arrays; Cathodes; Discharges (electric); Educational institutions; Fault diagnosis; Power electronics; Transient analysis;
Conference_Titel :
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
Conference_Location :
San Francisco, CA
DOI :
10.1109/PLASMA.2013.6634980