Atomic Force Microscopy-based repeatable surface nanomachining for nanochannels on bare silicon substrates

The Atomic Force Microscopy (AFM)-based repeatable nanomachining for nanochannels on bare silicon surface is investigated experimentally. A relationship between the normal force applied on the AFM cantilever and the channel depth is established. Thus, current results can be regarded as the calibration reference in order to accurately predict the nanochannel depth for additional nanotechnology related applications. An accurate prediction of the depth is not only for accuracy and efficiency, but also to prevent a costly diamond tip from unnecessary wearing out. Furthermore, the experimental results also reveal that the fabrication procedure is repeatable, and multiple scratching will further increase the depth of the nanochannel.