DocumentCode :
1597626
Title :
Measurement of the sheath surrounding a planar electron emitting surface in the afterglow of an RF plasma
Author :
Sheehan, J.P. ; Barnat, E.V. ; Weatherford, B.R. ; Hershkowitz, Noah
Author_Institution :
Univ. of Michigan, Ann Arbor, MI, USA
fYear :
2013
Firstpage :
1
Lastpage :
1
Abstract :
Summary form only given. The potential of a sheath surrounding a planar, electron emitting cathode was measured in the afterglow of a capacitively coupled RF plasma. Using Langmuir and emissive probes, the electron temperature and plasma potential were measured as a function of time. The inflection point in the limit of zero emission, a highly accurate emissive probe technique to measure the plasma potential, was used to make time resolved measurements for the first time. Measurements showed that as the plasma electron temperature cooled, approaching the emitted electron temperature, the emissive sheath potential shrank to zero. These results were in good qualitative agreement with a new theory of emissive sheaths, but deviations at intermediate temperature ratios indicate that the behavior of the emissive sheath is not yet fully understood.
Keywords :
Langmuir probes; afterglows; cathodes; plasma sheaths; plasma temperature; plasma transport processes; Langmuir probes; capacitively coupled RF plasma afterglow; electron emitting cathode; emissive probes; emissive sheath potential; emitted electron temperature; inflection point; planar electron emitting surface; plasma electron temperature; plasma potential; sheath measurement; time resolved measurements;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
Conference_Location :
San Francisco, CA
ISSN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2013.6635042
Filename :
6635042
Link To Document :
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