Fluorene-type thin films synthesized under biphenyl and ethylene RF plasma

Author

Mansuroglu, Dogan ; Manolache, Sorin

Author_Institution

Dept. of Phys., Middle East Tech. Univ., Ankara, Turkey

fYear

2012

Firstpage

1

Lastpage

6

Abstract

The mixture of biphenyl (C₁₂H₁₀) and ethylene (C₂H₄) plasma was used to synthesize fluorene (C₁₃H₁₀)-type films by a 13.56 MHz capacitive coupled RF plasma system. The thin films were deposited on glass slides. Changes of layers were investigated when a negative bias potential was applied to the holder of the substrate. The chemical environment was explored by residual gas analysis (RGA) mass spectrometry. Deposited layers were investigated by UV-visible spectroscopy, Atomic Force Microscope (AFM) and ellipsometry. The thin films were doped with Iodine (I₂) for different time periods.

Keywords

atomic force microscopy; conducting polymers; doping; ellipsometry; iodine; mass spectroscopic chemical analysis; mixtures; plasma deposition; polymer films; ultraviolet spectra; visible spectra; AFM; I; SiO₂; UV-visible spectroscopy; atomic force microscopy; biphenyl mixtures; capacitive coupled RF plasma deposition; conjugated polymers; deposited layers; ellipsometry; ethylene mixtures; fluorene-type thin films; frequency 13.56 MHz; glass slides; iodine doping; mass spectrometry; negative bias potential; residual gas analysis; substrate holder; Atomic layer deposition; Films; Polymers; Spectroscopy; USA Councils;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology (IEEE-NANO), 2012 12th IEEE Conference on

Conference_Location

Birmingham

ISSN

1944-9399

Print_ISBN

978-1-4673-2198-3

Type

conf

DOI

10.1109/NANO.2012.6322000

Filename

6322000