DocumentCode
1599790
Title
Pulsed high-density hydrogen plasma source for wakefield accelerator applications
Author
Pendleton, Scott J. ; Kuthi, A. ; Gundersen, Hao Chen Martin A. ; Muggli, P.
Author_Institution
Ming Hsieh Dept. of Electr. Eng.-Electrophys., Univ. of Southern California, Los Angeles, CA, USA
fYear
2013
Firstpage
1
Lastpage
1
Abstract
Summary form only given. Reported are new results for pulsed power-driven hollow cathode hydrogen-based plasma source development, needed for plasma-based accelerator experiments, including particle-beam-driven plasma wakefield accelerators. Capillary sources have been constructed of transparent cylindrical borosilicate glass tubes in lengths up to 15 cm and inner diameters up to 2 mm. The plasma discharge is presently driven by a thyratron-switched pulse forming network and step-up transformer. Uniform plasma densities of over 1018 cm-3 have been demonstrated, and the length and density can be readily varied for optimal performance. The pulsed power requirements for increasing capillary size and optimization of solid-state pulsed power switching for the purpose of increased flexibility, energy minimization and long life will be discussed. Time dependence of plasma density, and other variations of the device parameters for fine-tuning of accelerator applications is analyzed and discussed, including the use of this discharge at accelerator facilities for plasma wakefield experiments.
Keywords
borosilicate glasses; glow discharges; hydrogen; plasma accelerators; plasma density; plasma sources; plasma-beam interactions; thyratrons; wakefield accelerators; B2O3-SiO2; H2; accelerator facility; capillary size; capillary sources; device parameter; energy minimization; flexibility; optimization; particle beam-driven plasma wakefield accelerators; plasma discharge; plasma-based wakefield accelerator; pulsed high-density hydrogen plasma source; pulsed power-driven hollow cathode hydrogen-based plasma source; solid-state pulsed power switching; step-up transformer; thyratron-switched pulse forming network; time dependence; transparent cylindrical borosilicate glass tubes; uniform plasma density; wakefield accelerator application; Awards activities; Discharges (electric); Educational institutions; Hydrogen; Plasma density; Plasma sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
Conference_Location
San Francisco, CA
ISSN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2013.6635127
Filename
6635127
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