Rayleigh diffraction limit on photolithography relaxation using non-linear optical devices

The main disadvantage of the traditional photo-lithography and main problem for high level integration in microelectronics and photonics engineering is minimum line width which is determined by Rayleigh diffraction limit. In this work, we examine the relaxation condition of this trouble using non-linear optical effects. We show that, increasing threshold value in the reflective type non-linear optical devices can decrease the minimum line width. Therefore, our idea can be suitable approach for nano-technology device and system implementation.