Multilayer conformal coating of highly dense Multi-Walled Carbon Nanotubes bundles

Author

Fiorentino, Giuseppe ; Vollebregt, Sten ; Ishihara, Ryoichi ; Sarro, Pasqualina M.

Author_Institution

Fac. of Electr. Eng., Math. & Comput. Sci., Delft Univ. of Technol., Delft, Netherlands

fYear

2012

Firstpage

1

Lastpage

5

Abstract

Atomic layer deposition (ALD) is used to deposit ultra-thin and conformal films on flat substrates, porous structures, micro/nano particles and high aspect ratios structures. In this paper we demonstrate the multilayer conformal coating of highly dense Multi-walled Carbon Nanotubes (MWCNTs) bundles grown as islands onto an insulating layer. The multilayered coating consists of alternating layers of dielectric (Aluminium Oxide) and conductive (Titanium Nitride) materials. The coated carbon nanotubes bundles can work as fully integrated nanoelectronic devices and sensors.

Keywords

atomic layer deposition; carbon nanotubes; conformal coatings; dielectric materials; multilayers; nanofabrication; nanoparticles; nanoporous materials; thin films; ALD; Al₂O₃; C; TiN; aspect ratio; atomic layer deposition; conductive materials; conformal films; dense multiwalled carbon nanotubes bundles; dielectric materials; flat substrates; insulating layer; integrated nanoelectronic devices; integrated nanoelectronic sensors; microparticles; multilayer conformal coating; nanoparticles; porous structures; Aluminum; Atomic layer deposition; Dielectrics; Geometry; Nanoscale devices; Photonic band gap; Tin;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology (IEEE-NANO), 2012 12th IEEE Conference on

Conference_Location

Birmingham

ISSN

1944-9399

Print_ISBN

978-1-4673-2198-3

Type

conf

DOI

10.1109/NANO.2012.6322054

Filename

6322054