DocumentCode
1600802
Title
An improved I-V model of 4H-SiC MESFETs incorporating substrate trapping, surface trapping and thermal effects
Author
Rao, M.H.L. ; Murty, N. V. L. Narasimha
Author_Institution
Sch. of Electr. Sci., Indian Inst. of Technol. Bhubaneswar, Bhubaneswar, India
fYear
2013
Firstpage
75
Lastpage
78
Abstract
An improved analytical model for the DC characteristics of 4H-SiC MEtal Semiconductor Field Effect Transistors (MESFETs) is proposed. The model takes into account three major effects namely substrate trapping, surface trapping and thermal effects to describe the DC behavior of the device. The analytical model of I-V characteristics incorporate Caughey-Thomas model of field dependence electron mobility, substrate trapping of electrons by multiple deep level traps (which is the characteristic of 4H-SiC) and two-dimensional analysis of charge distribution under the gate. The collapse of drain current is observed on the I-V characteristics. This unique model proposed is a complete model which takes into consideration all the critical material defects and thermal effects with trapping. Hence the model behavior is very close to real time MESFET.
Keywords
Schottky gate field effect transistors; electron mobility; silicon compounds; Caughey-Thomas model; DC characteristic; I-V model; MESFET; SiC; charge distribution; drain current; field dependence electron mobility; metal semiconductor field effect transistor; substrate trapping; surface trapping; thermal effect; Analytical models; Electron traps; Logic gates; MESFETs; Substrates; 4H-SiC; MESFET; Multiple Trapping; Self heating effects;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices (CDE), 2013 Spanish Conference on
Conference_Location
Valladolid
Print_ISBN
978-1-4673-4666-5
Electronic_ISBN
978-1-4673-4667-2
Type
conf
DOI
10.1109/CDE.2013.6481346
Filename
6481346
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