• DocumentCode
    1600802
  • Title

    An improved I-V model of 4H-SiC MESFETs incorporating substrate trapping, surface trapping and thermal effects

  • Author

    Rao, M.H.L. ; Murty, N. V. L. Narasimha

  • Author_Institution
    Sch. of Electr. Sci., Indian Inst. of Technol. Bhubaneswar, Bhubaneswar, India
  • fYear
    2013
  • Firstpage
    75
  • Lastpage
    78
  • Abstract
    An improved analytical model for the DC characteristics of 4H-SiC MEtal Semiconductor Field Effect Transistors (MESFETs) is proposed. The model takes into account three major effects namely substrate trapping, surface trapping and thermal effects to describe the DC behavior of the device. The analytical model of I-V characteristics incorporate Caughey-Thomas model of field dependence electron mobility, substrate trapping of electrons by multiple deep level traps (which is the characteristic of 4H-SiC) and two-dimensional analysis of charge distribution under the gate. The collapse of drain current is observed on the I-V characteristics. This unique model proposed is a complete model which takes into consideration all the critical material defects and thermal effects with trapping. Hence the model behavior is very close to real time MESFET.
  • Keywords
    Schottky gate field effect transistors; electron mobility; silicon compounds; Caughey-Thomas model; DC characteristic; I-V model; MESFET; SiC; charge distribution; drain current; field dependence electron mobility; metal semiconductor field effect transistor; substrate trapping; surface trapping; thermal effect; Analytical models; Electron traps; Logic gates; MESFETs; Substrates; 4H-SiC; MESFET; Multiple Trapping; Self heating effects;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices (CDE), 2013 Spanish Conference on
  • Conference_Location
    Valladolid
  • Print_ISBN
    978-1-4673-4666-5
  • Electronic_ISBN
    978-1-4673-4667-2
  • Type

    conf

  • DOI
    10.1109/CDE.2013.6481346
  • Filename
    6481346