• DocumentCode
    1601551
  • Title

    Ballistic deflection transistor: Geometry dependence and boolean operations

  • Author

    Iniguez-de-la-Torre, I. ; Mateos, Javier ; Gonzalez, Temoatzin ; Kaushal, V. ; Margala, Martin

  • Author_Institution
    Dept. de Fis. Aplic., Univ. de Salamanca, Salamanca, Spain
  • fYear
    2013
  • Firstpage
    187
  • Lastpage
    190
  • Abstract
    In this work, a room temperature study of ballistic deflection transistors (BDTs) is performed. By applying various processing steps such as hard mask deposition, e-beam lithography, reactive ion etching, etc., BDTs were fabricated, and the interplay between the geometry and their performance is analyzed. The importance of the top drain terminal is also examined. The application of the BDT for different logic configurations on the basis of its asymmetric biasing behavior is studied. Using this concept, even a single BDT can be used as a logic gate.
  • Keywords
    nanoelectronics; transistors; BDT; Boolean operations; asymmetric biasing behavior; ballistic deflection transistor; e-beam lithography; geometry dependence; hard mask deposition; logic configurations; logic gate; nanoelectronic device; reactive ion etching; temperature 293 K to 298 K; top drain terminal; Geometry; Lithography; Logic gates; Optical wavelength conversion; Performance evaluation; Transconductance; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices (CDE), 2013 Spanish Conference on
  • Conference_Location
    Valladolid
  • Print_ISBN
    978-1-4673-4666-5
  • Electronic_ISBN
    978-1-4673-4667-2
  • Type

    conf

  • DOI
    10.1109/CDE.2013.6481374
  • Filename
    6481374