DocumentCode
1601551
Title
Ballistic deflection transistor: Geometry dependence and boolean operations
Author
Iniguez-de-la-Torre, I. ; Mateos, Javier ; Gonzalez, Temoatzin ; Kaushal, V. ; Margala, Martin
Author_Institution
Dept. de Fis. Aplic., Univ. de Salamanca, Salamanca, Spain
fYear
2013
Firstpage
187
Lastpage
190
Abstract
In this work, a room temperature study of ballistic deflection transistors (BDTs) is performed. By applying various processing steps such as hard mask deposition, e-beam lithography, reactive ion etching, etc., BDTs were fabricated, and the interplay between the geometry and their performance is analyzed. The importance of the top drain terminal is also examined. The application of the BDT for different logic configurations on the basis of its asymmetric biasing behavior is studied. Using this concept, even a single BDT can be used as a logic gate.
Keywords
nanoelectronics; transistors; BDT; Boolean operations; asymmetric biasing behavior; ballistic deflection transistor; e-beam lithography; geometry dependence; hard mask deposition; logic configurations; logic gate; nanoelectronic device; reactive ion etching; temperature 293 K to 298 K; top drain terminal; Geometry; Lithography; Logic gates; Optical wavelength conversion; Performance evaluation; Transconductance; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices (CDE), 2013 Spanish Conference on
Conference_Location
Valladolid
Print_ISBN
978-1-4673-4666-5
Electronic_ISBN
978-1-4673-4667-2
Type
conf
DOI
10.1109/CDE.2013.6481374
Filename
6481374
Link To Document