DocumentCode
1601928
Title
Ge/Si quantum dot photodetectors for midinfrared applications
Author
Yakimov, A. ; Bloshkin, A. ; Timofeev, V. ; Nikiforov, A. ; Dvurechenskii, A.
Author_Institution
Rzhanov Inst. of Semicond. Phys., Novosibirsk, Russia
fYear
2012
Firstpage
1
Lastpage
2
Abstract
Ge/Si quantum dots fabricated by molecular-beam epitaxy at 500 C are overgrown with Si at different temperatures Tcap, and their mid-infrared photoresponse is investigated. The photocurrent maximum shifts from 2.3 to 3.9 μm with increasing Tcap from 300 to 750 C. The best performance is achieved for the detector with Tcap= 600 C in a photovoltaic mode. At a sample temperature of 90 K and no applied bias, a responsivity of 0.43×10-3 A/W and detectivity of 6:2×1010 cm Hz1/2 /W at λ= 3 μm were measured under normal incidence infrared radiation. The device exhibits very low dark current (Idark= 2 nA/cm2 at T= 90 K and U= - 0:2 V) and operates until 200 K.
Keywords
dark conductivity; elemental semiconductors; germanium; infrared detectors; molecular beam epitaxial growth; photoconductivity; photodetectors; semiconductor quantum dots; silicon; Ge-Si; dark current; detectivity measurement; infrared photoresponse; midinfrared applications; molecular beam epitaxy; normal incidence infrared radiation; photocurrent; photovoltaic mode; quantum dot fabrication; quantum dot photodetector; responsivity measurement; temperature 300 C to 750 C; temperature 90 K; Atmospheric measurements; Detectors; Particle measurements; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology (IEEE-NANO), 2012 12th IEEE Conference on
Conference_Location
Birmingham
ISSN
1944-9399
Print_ISBN
978-1-4673-2198-3
Type
conf
DOI
10.1109/NANO.2012.6322110
Filename
6322110
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