• DocumentCode
    1601928
  • Title

    Ge/Si quantum dot photodetectors for midinfrared applications

  • Author

    Yakimov, A. ; Bloshkin, A. ; Timofeev, V. ; Nikiforov, A. ; Dvurechenskii, A.

  • Author_Institution
    Rzhanov Inst. of Semicond. Phys., Novosibirsk, Russia
  • fYear
    2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Ge/Si quantum dots fabricated by molecular-beam epitaxy at 500 C are overgrown with Si at different temperatures Tcap, and their mid-infrared photoresponse is investigated. The photocurrent maximum shifts from 2.3 to 3.9 μm with increasing Tcap from 300 to 750 C. The best performance is achieved for the detector with Tcap= 600 C in a photovoltaic mode. At a sample temperature of 90 K and no applied bias, a responsivity of 0.43×10-3 A/W and detectivity of 6:2×1010 cm Hz1/2 /W at λ= 3 μm were measured under normal incidence infrared radiation. The device exhibits very low dark current (Idark= 2 nA/cm2 at T= 90 K and U= - 0:2 V) and operates until 200 K.
  • Keywords
    dark conductivity; elemental semiconductors; germanium; infrared detectors; molecular beam epitaxial growth; photoconductivity; photodetectors; semiconductor quantum dots; silicon; Ge-Si; dark current; detectivity measurement; infrared photoresponse; midinfrared applications; molecular beam epitaxy; normal incidence infrared radiation; photocurrent; photovoltaic mode; quantum dot fabrication; quantum dot photodetector; responsivity measurement; temperature 300 C to 750 C; temperature 90 K; Atmospheric measurements; Detectors; Particle measurements; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2012 12th IEEE Conference on
  • Conference_Location
    Birmingham
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4673-2198-3
  • Type

    conf

  • DOI
    10.1109/NANO.2012.6322110
  • Filename
    6322110