Title :
Tuning the noise margins of gate-all-around MOSFET based inverters through non-circular multi-channel architecture
Author :
Jha, Somesh ; Saha, Jhuma ; Kumar, Sudhakar
Author_Institution :
Dept. of Electron. Eng., Indian Sch. of Mines, Dhanbad, India
Abstract :
Gate-all-around (GAA) metal-oxide-semiconductor field-effect transistors (MOSFETs) are high priority research topics of the present day. The ability to increase the drive current through a multi-channel (MC) architecture is a unique feature in GAA devices. Limitations in the fabrication process may result in non-circular cross-section of GAA MOSFETs. The most practical approach is the elliptical cross-section which is characterized by a geometry aspect ratio (AR) defined as the ratio of major and minor axes. In this paper, we have investigated the effects of AR and MC architectures on the noise margins (NMs) (high and low) of MC GAA MOSFET based CMOS inverters. We have developed a simulator which can faithfully plot the voltage-transfer characteristics (VTC) of such circuits. Analytical equations have been presented to model the NMs. To judge the reliability of our model, we have validated the same with reported experimental data and the average deviation obtained was within 1.2% (NMH) to 5.1% (NML). Our analysis has also been extended to explore the possibilities of enhancing the circuit performance by using high-k materials.
Keywords :
CMOS logic circuits; circuit tuning; integrated circuit noise; logic gates; AR; MC GAA MOSFET based CMOS inverters; NMs; VTC; analytical equations; circuit performance; elliptical cross-section; fabrication process; gate-all-around MOSFET based inverters; geometry aspect ratio; high-k materials; major axes ratio; metal-oxide-semiconductor field-effect transistors; minor axes ratio; noise margin tuning; noncircular cross-section; noncircular multichannel architecture; voltage-transfer characteristics; CMOS integrated circuits; Inverters; Logic gates; MOSFET; Mathematical model; Silicon; CMOS; Gate-all-around (GAA); MOSFETs; VTC; high-k; multi-channel; noise margin;
Conference_Titel :
Advances in Electrical Engineering (ICAEE), 2014 International Conference on
Conference_Location :
Vellore
DOI :
10.1109/ICAEE.2014.6838471