• DocumentCode
    1603183
  • Title

    Field emission from film coated Mo emitters (in FEAs and single tips) and vapor deposited emitters of HfC and ZrC

  • Author

    Tianbao Xie ; Mackie, W.A. ; Davis, P.R.

  • Author_Institution
    Linfield Res. Inst., McMinnville, OR, USA
  • fYear
    1998
  • Firstpage
    127
  • Abstract
    Summary form only given. We have been working for several years on field emission from hafnium carbide and zirconium carbide. These studies have covered emission from solid carbide emitters as well as thin film carbide overcoatings on single tip field emitters and field emitter arrays. These materials are attractive candidates for low voltage microelectronic field emitter arrays. Uses for arrays or single emitters of these carbides include microwave applications, video displays, high current, small spot electron sources, and cold cathodes for operation in poor vacuums. Since molybdenum is one common FEA emitter material we used it in this study. Our aim is to determine improvements in I-V characteristics, emission stability, capability of emission at high currents and in poor vacuum conditions, and the ability to withstand exposure to atmospheric pressure without degradation. Mo FEAs as well as individually fabricated Mo field emitters were dosed via PVD from a high-purity ZrC source. The deposited film was followed by determination of I-V characteristics. The results of these experiments indicate that work function reductions of the order of 1 eV can be achieved.
  • Keywords
    field emission; hafnium compounds; molybdenum; vacuum microelectronics; vapour deposited coatings; zirconium compounds; HfC; I-V characteristics; Mo; ZrC; cold cathodes; film coated Mo emitters; low voltage microelectronic field emitter arrays; microwave applications; single tips; vapor deposited emitters; work function; Electron sources; Field emitter arrays; Flat panel displays; Hafnium; Low voltage; Microelectronics; Microwave antenna arrays; Solids; Transistors; Zirconium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1998. 25th Anniversary. IEEE Conference Record - Abstracts. 1998 IEEE International on
  • Conference_Location
    Raleigh, NC, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-4792-7
  • Type

    conf

  • DOI
    10.1109/PLASMA.1998.677509
  • Filename
    677509