Application of numerical simulations for determination of thin film optical parameters

Author

Pencheva, Tamara ; Nenkov, Milen

Author_Institution

Phys. Dept., Univ. of Russe, Bulgaria

Volume

2

fYear

2004

Firstpage

350

Abstract

The application of numerical simulations for investigation of thin film optical parameters is presented. A brief description of a color coordinates method for film optical constants determination, recently developed by the authors of this article, is given. The minimal film thickness, for which this method is applicable, is evaluated for different materials. A new method for investigation of optical inhomogeneity (refractive index distribution in the film depth) is described. The application of numerical simulation for the design of multilayer coatings, with predetermined spectral properties, is discussed. Some design examples of multilayer antireflectance (AR) coatings for semiconductor optoelectronic device requirements are given.

Keywords

antireflection coatings; inhomogeneous media; optical multilayers; refractive index; thin films; color coordinates method; film depth refractive index distribution; film optical constants determination; multilayer antireflectance coatings; multilayer coating spectral properties; numerical simulation; optical inhomogeneity; semiconductor optoelectronic devices; thin film optical parameter determination; thin solid films; Coatings; Nonhomogeneous media; Numerical simulation; Optical films; Optical materials; Optical refraction; Optical variables control; Refractive index; Semiconductor films; Semiconductor materials;

fLanguage

English

Publisher

ieee

Conference_Titel

Electronics Technology: Meeting the Challenges of Electronics Technology Progress, 2004. 27th International Spring Seminar on

Print_ISBN

0-7803-8422-9

Type

conf

DOI

10.1109/ISSE.2004.1490450

Filename

1490450