• DocumentCode
    1604107
  • Title

    Using chemical solution process to fabricate zinc oxide micro/nano-structure on GaN with different growth time

  • Author

    Ku, Chun-Wei ; Kao, Chia-Yu ; Lin, Ching-Fuh

  • Author_Institution
    Grad. Inst. of Photonics & Optoelectron., Nat. Taiwan Univ., Taipei, Taiwan
  • fYear
    2012
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    High-quality single crystal ZnO thin film was grown on an GaN epitaxial layer through a simple low-temperature solution process. X-ray diffraction and field emission scanning electron microscopy shows that ZnO thin film is well oriented along the (0001) plane of GaN. Atomic force microscopy also reveals the ZnO thin film is extremely smooth on GaN. The photoluminescence spectrum for the ZnO-GaN hetero-structure showed a peak in the ultra-violet region and a broad band transition in the yellow emission range. Furthermore, this high-quality single crystal ZnO thin film has the potential to recycle the substrates to reduce the cost via chemical etching.
  • Keywords
    X-ray diffraction; atomic force microscopy; epitaxial layers; field emission electron microscopy; X-ray diffraction; atomic force microscopy; broad band transition; chemical etching; chemical solution process; epitaxial layer; field emission scanning electron microscopy; heterostructure; photoluminescence spectrum; thin film; ultraviolet region; yellow emission range; zinc oxide micro/nano-structure; Broadband communication; Epitaxial growth; Gallium nitride; Nitrogen; X-ray diffraction; Zinc;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2012 12th IEEE Conference on
  • Conference_Location
    Birmingham
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4673-2198-3
  • Type

    conf

  • DOI
    10.1109/NANO.2012.6322182
  • Filename
    6322182