DocumentCode
1604107
Title
Using chemical solution process to fabricate zinc oxide micro/nano-structure on GaN with different growth time
Author
Ku, Chun-Wei ; Kao, Chia-Yu ; Lin, Ching-Fuh
Author_Institution
Grad. Inst. of Photonics & Optoelectron., Nat. Taiwan Univ., Taipei, Taiwan
fYear
2012
Firstpage
1
Lastpage
4
Abstract
High-quality single crystal ZnO thin film was grown on an GaN epitaxial layer through a simple low-temperature solution process. X-ray diffraction and field emission scanning electron microscopy shows that ZnO thin film is well oriented along the (0001) plane of GaN. Atomic force microscopy also reveals the ZnO thin film is extremely smooth on GaN. The photoluminescence spectrum for the ZnO-GaN hetero-structure showed a peak in the ultra-violet region and a broad band transition in the yellow emission range. Furthermore, this high-quality single crystal ZnO thin film has the potential to recycle the substrates to reduce the cost via chemical etching.
Keywords
X-ray diffraction; atomic force microscopy; epitaxial layers; field emission electron microscopy; X-ray diffraction; atomic force microscopy; broad band transition; chemical etching; chemical solution process; epitaxial layer; field emission scanning electron microscopy; heterostructure; photoluminescence spectrum; thin film; ultraviolet region; yellow emission range; zinc oxide micro/nano-structure; Broadband communication; Epitaxial growth; Gallium nitride; Nitrogen; X-ray diffraction; Zinc;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology (IEEE-NANO), 2012 12th IEEE Conference on
Conference_Location
Birmingham
ISSN
1944-9399
Print_ISBN
978-1-4673-2198-3
Type
conf
DOI
10.1109/NANO.2012.6322182
Filename
6322182
Link To Document