• DocumentCode
    1604414
  • Title

    Silicon monolithic micromechanical gyroscope

  • Author

    Greiff, P. ; Boxenhorn, B. ; King, T. ; Niles, L.

  • Author_Institution
    Charles Stark Draper Lab., Cambridge, MA, USA
  • fYear
    1991
  • Firstpage
    966
  • Lastpage
    968
  • Abstract
    A monolithic silicon gyroscope is described which is completely batch fabricated on a silicon wafer. Only one side of the wafer is employed so the process is readily adaptable to any size wafer. The gimbals, flexures, and electrodes are all made on the same substrate so that a mass-producible instrument is realized. The process is compatible with the use of on-chip electronics, which will be required to maximize the performance of the instrument. The authors describe several methods of incorporating the electrodes within the device substrate. They enumerate the advantages of the monolithic construction, and mention potential areas of application. Initial test data showed a noise-limited rate detection capability of 4 deg/s at a 1-Hz bandwidth.<>
  • Keywords
    electric sensing devices; elemental semiconductors; inertial navigation; micromechanical devices; military equipment; monolithic integrated circuits; silicon; 1 Hz; Si gyroscope; batch fabrication; electrodes; elemental semiconductor; flexures; gimbals; mass-producible instrument; monolithic micromechanical gyroscope; noise-limited rate detection capability; on-chip electronics; performance; smart weapons; Accelerometers; Electrodes; Fixtures; Frequency; Glass; Gyroscopes; Instruments; Laboratories; Micromechanical devices; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Sensors and Actuators, 1991. Digest of Technical Papers, TRANSDUCERS '91., 1991 International Conference on
  • Conference_Location
    San Francisco, CA, USA
  • Print_ISBN
    0-87942-585-7
  • Type

    conf

  • DOI
    10.1109/SENSOR.1991.149051
  • Filename
    149051