DocumentCode :
1604964
Title :
Double-gate suspended silicon nanowire transistors with tunable threshold voltage for chemical/biological sensing applications
Author :
Ghiass, Mohammad Adel ; Tsuchiya, Yoshishige ; Hassani, Faezeh Arab ; Dupre, Cécilia ; Ollier, E. ; Cherman, Vladimir ; Armini, Silvia ; Bartsch, Sebastian ; Tsamados, Dimitrios ; Mizuta, Hiroshi
Author_Institution :
Nano Res. Group, Univ. of Southampton, Southampton, UK
fYear :
2012
Firstpage :
1
Lastpage :
4
Abstract :
A double-gate suspended silicon nanowire transistor (DGSSiNWT) is proposed for conduction-based chemical/biological sensing applications. The doping profile is uniform across the device without any junction. The suspended silicon nanowire (SiNW) provides a larger surface area that can be used to enhance the sensitivity. Two side gates, which work as the main gate and tuning gate, are separated from the SiNW by air gap and control the electrical conduction of the suspended structure. Using the tuning gate, we have optimized the operating point of device to achieve the highest sensitivity. The sensitivity, defined as the ratio of threshold voltage shift to tuning gate voltage variation, is observed to be up to 6.5. The estimated charge sensitivity of our devices is at least 20 times higher than the reported value for non-suspended SiNW transistors.
Keywords :
MOSFET; air gaps; biosensors; chemical sensors; doping profiles; electrical conductivity; elemental semiconductors; nanosensors; nanowires; silicon; suspensions; DGSSiNWT; Si; air gap; conduction-based chemical-biological sensing applications; device operating point; doping profile; double-gate suspended silicon nanowire transistors; electrical conduction control; main gate; nonsuspended silicon NW transistors; surface area; suspended structure; threshold voltage shift; tunable threshold voltage; tuning gate; tuning gate voltage variation; Chemicals; Immune system; Lead; Logic gates; Oxidation; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology (IEEE-NANO), 2012 12th IEEE Conference on
Conference_Location :
Birmingham
ISSN :
1944-9399
Print_ISBN :
978-1-4673-2198-3
Type :
conf
DOI :
10.1109/NANO.2012.6322216
Filename :
6322216
Link To Document :
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