A route for periodic nanodot fabrication in substrates using nanochanel alumina membranes as masks for ion implantation

Progress in ion implantation of metal ions into substrates of amorphous silica or Si-nitride with respect to lateral periodic patterning is presented. We use a 2D-nanoporous membrane of anodic aluminium oxide (AAO) as mask to conduct the Co ion implantations. The criteria for successful masked implantation and main problems are presented, including testing of the masks in a focused ion beam (FIB) system. It is proposed that electron transparent thin windows are the most suitable substrate for methods development, as TEM observation can be followed without any further sample milling. Co clusters are found to exhibit the same lateral order as the pores, and first annealing tests to achieve Co nanoparticles are shown using an in-situ heating TEM holder.