Freestanding and embedded ferroelectric nanograins by advanced chemical solution deposition methods

Nanoscopic ferroelectrics continue to be of great interest due to their possible integration into miniaturized electronic devices. For research tasks as well as for microelectronic production lines chemical deposition methods show thereby distinct advantages. This paper shortly reviews the chemical solution deposition (CSD) based approaches to fabricate ferroelectric nanograins. Compared to the often applied subtractive methods based on lithography and etching or focused ion beam (FIB) this method avoids damaging the prepared ferroelectric nanostructures. The precursor based methods are complemented by microemulsion mediated approaches for the deposition of ferroelectric nanoislands as well as for films.