• DocumentCode
    1608162
  • Title

    Behavior of temperature inside PN junction during microplasma switching

  • Author

    Raska, M. ; Andreev, A. ; Holcman, V. ; Koktavy, P.

  • Author_Institution
    Dept. of Phys., BUT, Brno, Czech Republic
  • fYear
    2008
  • Firstpage
    51
  • Lastpage
    54
  • Abstract
    The contribution is focused on determination of a temperature inside PN junction defect regions. These defect regions are called microplasmas. The microplasma is specified like region with a lower strong-field avalanche ionization breakdown voltage than other homogenous PN junction regions. The existence of such regions may lead to local avalanche breakdowns occurring in reverse-biased PN junction at certain voltage. These local avalanche breakdowns may exhibit like a current impulse noise. These impulses are usually represented by constant amplitude, random pulse width and random pulse origin time points. During the measurement of the microplasma noise was observed a relation between two-states current impulse noise and a temperature of a PN junction defect region. The main goal of this article is a determination of temperature behavior inside the microplasma region depends on a current impulse noise time behavior.
  • Keywords
    avalanche breakdown; p-n junctions; semiconductor device breakdown; semiconductor diodes; temperature measurement; PN junction defect; current impulse noise time; microplasma switching; reverse-biased PN junction; strong-field avalanche ionization breakdown voltage; temperature determination; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Technology, 2008. ISSE '08. 31st International Spring Seminar on
  • Conference_Location
    Budapest
  • Print_ISBN
    978-1-4244-3972-0
  • Electronic_ISBN
    978-1-4244-3974-4
  • Type

    conf

  • DOI
    10.1109/ISSE.2008.5276469
  • Filename
    5276469