Title :
Micromachined solenoids for highly sensitive magnetic sensors
Author :
Kawahito, S. ; Sasaki, Y. ; Ashiki, M. ; Nakamura, T.
Author_Institution :
Dept. of Electr. & Electron. Eng., Toyohashi Univ. of Technol., Japan
Abstract :
Micromachined solenoids on silicon wafer for highly sensitive vector magnetic field sensors have been proposed. The feature of the solenoids is that the magnetic field is parallel to the wafer surface. In order to realize interconnections on three-dimensional structure, direct electron beam lithography was utilized. The formation of Mo interconnections was achieved on the surface of deep U-shaped grooves. Applications of the solenoids are also discussed.<>
Keywords :
electric sensing devices; electron beam lithography; magnetic field measurement; micromechanical devices; silicon; solenoids; Mo interconnections; Si wafer; deep U-shaped grooves; direct electron beam lithography; highly sensitive magnetic sensors; micromachined solenoids; three-dimensional structure; Electron beams; Fabrication; Integrated circuit interconnections; Lithography; Magnetic cores; Magnetic fields; Magnetic sensors; Resists; Silicon; Solenoids;
Conference_Titel :
Solid-State Sensors and Actuators, 1991. Digest of Technical Papers, TRANSDUCERS '91., 1991 International Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
0-87942-585-7
DOI :
10.1109/SENSOR.1991.149084
