Title :
Thermoelectrical properties of TiO2:(Co, Pd) and TiO2:Nb thin films
Author :
Prociów, E. ; Mazur, M. ; Domaradzki, J. ; Wojcieszak, D. ; Kaczmarek, D. ; Gawor, T.
Author_Institution :
Fac. of Microsyst. Electron. & Photonics, Wroclaw Univ. of Technol., Wroclaw, Poland
Abstract :
In this work thermoelectrical properties of TiO2:(Co, Pd) and TiO2:Nb thin films have been described. Thin films were performed by high energy magnetron sputtering method. Sputtering process was carried out from mosaic targets under low pressure of oxygen reactive gas. Electrical and thermoelectrical properties of as deposited and annealed at 800 K thin films were analyzed based on resistivity and thermoelectrical voltage measurements. Results have shown that manufactured thin films had different type of electrical conductivity and good thermoelectrical stability.
Keywords :
annealing; cobalt; electrical conductivity; electrical resistivity; niobium; palladium; sputter deposition; thermoelectricity; thin films; titanium compounds; TiO2:Co,Pd; TiO2:Nb; annealing; electrical conductivity; electrical resistivity; high energy magnetron sputtering; mosaic targets; oxygen reactive gas; temperature 800 K; thermoelectrical properties; thermoelectrical stability; thermoelectrical voltage measurements; thin films; Annealing; Conductivity; Temperature; Temperature measurement; Temperature sensors; Voltage measurement;
Conference_Titel :
Advanced Semiconductor Devices & Microsystems (ASDAM), 2010 8th International Conference on
Conference_Location :
Smolenice
Print_ISBN :
978-1-4244-8574-1
DOI :
10.1109/ASDAM.2010.5666345
