DocumentCode :
1609621
Title :
Characterization of thin oxide layers by use of the atomic force acoustic microscopy
Author :
Striegler, Andre ; Kopycinska-Mueller, Malgorzata ; Koehler, Bernd ; Wolter, Klaus-juergen ; Meyendorf, Norbert
Author_Institution :
Electron. Packaging Lab. (German abbrev. IAVT), Tech. Univ. Dresden, Dresden, Germany
fYear :
2008
Firstpage :
167
Lastpage :
169
Abstract :
We investigated the influence of thin oxide layers present on the surface of polycrystalline copper on the effective stiffness of the sample surface. The thicknesses of the oxide layers were in the range of single to few tens of nanometers. In order to detect the presence of such thin films on a sample surface, the so called atomic force acoustic microscopy (AFAM) technique was used. The investigated sample was polycrystalline <111> oriented copper. The AFAM results obtained from heat treated sample were compared to these obtained for a reference sample with a thinner native oxide layer. The study revealed the ability of the AFAM technique to detect the presence of nanometer thin films. Our preliminary results suggest that AFAM technique may have a potential application for microelectronic industry as a tool for thin film characterization.
Keywords :
atomic force microscopy; atomic force acoustic microscopy; microelectronic industry; polycrystalline copper; polycrystalline oriented copper; thin film characterization; thin oxide layer; Acoustic signal detection; Atomic force microscopy; Atomic layer deposition; Coatings; Copper; Microelectronics; Nanotechnology; Stress measurement; Thickness measurement; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Technology, 2008. ISSE '08. 31st International Spring Seminar on
Conference_Location :
Budapest
Print_ISBN :
978-1-4244-3972-0
Electronic_ISBN :
978-1-4244-3974-4
Type :
conf
DOI :
10.1109/ISSE.2008.5276524
Filename :
5276524
Link To Document :
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