DocumentCode :
1611027
Title :
Effect of substrate temperature on the optical dispersion of sprayed nickel oxide thin films
Author :
Bakry, A.M. ; Mahmoud, S.A.
Author_Institution :
Phys. Dept., Univ. of Hail, Hail, Saudi Arabia
fYear :
2011
Firstpage :
1
Lastpage :
7
Abstract :
The various Crystalline and non-crystalline nickel oxide (NiO) thin films were obtained by spray pyrolysis technique (SPT) using nickel acetate tetrahydrate solutions onto glass substrates at different temperatures from 225 to 350 °C. Structure of the as-deposited NiO thin films have been examined by X-ray diffraction (XRD) and atomic force microscope (AFM). The results showed that an amorphous structure of the films at low substrate temperature (Ts=225°C), while at higher Ts >; 275°C, a cubic single phase structure of NiO film is formed. The refractive index (n) and the extinction coefficient (k) have been calculated from the corrected transmittance and reflectance measurements over the spectral range from 250 to 2400 nm. Some of the optical properties parameters, such as optical dispersion energies, Eo and Ed, dielectric constant, ϵ, the average values of oscillator strength, So, wavelength of single oscillator λo and plasma frequency, Ωp, have been evaluated.
Keywords :
X-ray diffraction; amorphous semiconductors; antiferromagnetic materials; atomic force microscopy; extinction coefficients; infrared spectra; magnetic semiconductors; nickel compounds; oscillator strengths; permittivity; pyrolysis; refractive index; semiconductor growth; semiconductor thin films; spray coating techniques; ultraviolet spectra; visible spectra; AFM; NiO; SiO2; UV-Vis-NIR double-beam spectra; X-ray diffraction; XRD; amorphous structure; antiferromagnetic semiconductor; atomic force microscopy; crystalline nickel oxide thin film structure; dielectric constant; extinction coefficient; glass substrates; nickel acetate tetrahydrate solutions; noncrystalline nickel oxide thin films; optical dispersion energy; optical properties; oscillator strength value; plasma frequency; refractive index; single oscillator wavelength; spray pyrolysis technique; substrate temperature; temperature 225 degC to 350 degC; wavelength 250 nm to 2400 nm; Dispersion; Nickel; Optical films; Plasma temperature; Refractive index; Substrates; AFM and XRD; Nickel Acetate; Nickel Oxide Thin Films; Optical Dispersion; spray pyrolysis technique;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics, Communications and Photonics Conference (SIECPC), 2011 Saudi International
Conference_Location :
Riyadh
Print_ISBN :
978-1-4577-0068-2
Electronic_ISBN :
978-1-4577-0067-5
Type :
conf
DOI :
10.1109/SIECPC.2011.5876956
Filename :
5876956
Link To Document :
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