DocumentCode

1612147

Title

Effective Apodized Phase Mask for Optimum FBGs

Author

Pan, J.J. ; Zhou, F.Q. ; Shi, Y. ; Li, S.X.

Author_Institution

E-TEK Dynamics, Inc.

fYear

1998

Firstpage

359

Lastpage

359

Keywords

Bandwidth; Etching; Reflectivity; Silicon compounds;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Europe, 1998. 1998 CLEO/Europe. Conference on

Conference_Location

Glasgow, Scotland

Print_ISBN

0-7803-4233X

Type

conf

DOI

10.1109/CLEOE.1998.719558

Filename

719558