Title :
New latch-up failure mechanism between different power pins in the mixed-voltage process [CMOS ICs]
Author :
Wu, Chau-Neng ; Chou, H.-M.
Author_Institution :
Taiwan Semicond. Manuf. Co., North America, San Jose, CA, USA
Abstract :
A new latch-up failure phenomenon, induced by the parasitic P-N-P-N path between different power pins, is reported here. The system voltage difference between IO and core blocks is the major factor to see whether the chips will have latch-up failure or not. This latch-up failure only occurs in 0.13 μm and 0.18 μm processes because the system voltage difference between IO and core circuitry could hold and sustain the latch-up path between IO and core power pins, but latch-up test passes in 0.25 μm because the parasitic P-N-P-N path could not be turned on. A traditional latch-up protection methodology with guide-ring insertion works well here, and chip designers need to be aware of this phenomenon and follow the design guideline for IO and core circuitry before the chip is taped-out.
Keywords :
CMOS integrated circuits; failure analysis; integrated circuit design; integrated circuit reliability; 0.13 micron; 0.18 micron; 0.25 micron; CMOS; IO/core blocks voltage difference; failure mechanism analysis; guide-ring insertion; latch-up failure mechanism; latch-up protection methodology; mixed-voltage process; power pins parasitic P-N-P-N path; CMOS integrated circuits; CMOS process; CMOS technology; Circuit testing; Equivalent circuits; Pins; Power supplies; Semiconductor device manufacture; Variable structure systems; Voltage;
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits, 2004. IPFA 2004. Proceedings of the 11th International Symposium on the
Print_ISBN :
0-7803-8454-7
DOI :
10.1109/IPFA.2004.1345549