DocumentCode :
1613007
Title :
SiC device technology for high voltage and RF power applications
Author :
Östling, M. ; Koo, S.M. ; Lee, S.-K. ; Danielsson, E. ; Domeij, M. ; Zetterling, C.-M.
Author_Institution :
Dept. of Microelectron. & Inf. Technol., R. Inst. of Technol., Kista, Sweden
Volume :
1
fYear :
2002
fDate :
6/24/1905 12:00:00 AM
Firstpage :
31
Abstract :
Recently, silicon carbide (SiC) has drawn considerable attention as a suitable semiconductor material for high power, high frequency, high temperature and radiation resistant devices. The commercialized substrates and the experimental device prototypes in SiC show the promises while the continued improvements in fabrication techniques are required for economically viable productions to be widespread. This paper reviews the progress and current issues in SiC device process technology and the state-of-the art SiC devices for high voltage and RF power applications.
Keywords :
UHF transistors; high-temperature electronics; microwave power transistors; radiation hardening (electronics); silicon compounds; wide band gap semiconductors; RF power applications; SiC; fabrication techniques; high temperature devices; high voltage applications; radiation resistant devices; wide band gap semiconductors; Commercialization; Fabrication; Power generation economics; Prototypes; Radio frequency; Semiconductor materials; Silicon carbide; Substrates; Temperature; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronics, 2002. MIEL 2002. 23rd International Conference on
Print_ISBN :
0-7803-7235-2
Type :
conf
DOI :
10.1109/MIEL.2002.1003145
Filename :
1003145
Link To Document :
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