DocumentCode :
1613422
Title :
Relative wavelet energy as a tool to select suitable wavelet for artifact removal in EEG
Author :
Salwani, M.D. ; Jasmy, Y.
Author_Institution :
Dept. of Electrical Eng., PPD, UTM Citycampus, Kuala Lumpur, Malaysia
fYear :
2005
Firstpage :
282
Lastpage :
287
Abstract :
We proposed a novel approach to select a wavelet for artifact removal in electroencephalogram (EEG) by comparing their relative wavelet energies before and after thresholding. Relative wavelet energy (RWE) gives information about the relative energy associated with different frequency bands and can be considered as a time-scale density. RWE can be used as a tool to detect and characterize a specific phenomenon in time and frequency planes. We used Lifting Wavelet Transform to remove the common artifacts exist in EEG i.e. blink and eye movements. Three basic steps involved are to transform the EEG, hard thresholding the wavelet coefficients and the corrected EEG is obtained by inverse transform these threshold coefficients. It is of paramount important to select a suitable wavelet and threshold to accomplish this task. From this study, we concluded that cdf4.4 outperformed db4 and haar wavelets by removing the artifacts at the correct times and frequency bands.
Keywords :
Electroencephalography; Electrooculography; Energy resolution; Frequency; Scalp; Signal resolution; Turing machines; Voltage; Wavelet coefficients; Wavelet transforms; EEG; lifting wavelet transform; ocular artifacts; relative wavelet energy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Computers, Communications, & Signal Processing with Special Track on Biomedical Engineering, 2005. CCSP 2005. 1st International Conference on
Conference_Location :
Kuala Lumpur, Malaysia
Print_ISBN :
978-1-4244-0011-9
Electronic_ISBN :
978-1-4244-0012-6
Type :
conf
DOI :
10.1109/CCSP.2005.4977207
Filename :
4977207
Link To Document :
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