DocumentCode :
1613624
Title :
Pulsed Low Energy Electron Sources for Material Surface Modification
Author :
Korenev, Sergey ; Johnson, Rolland P. ; Sah, Richard
Author_Institution :
Muons Inc., Batavia
fYear :
2007
Firstpage :
159
Lastpage :
159
Abstract :
Two conceptual designs of pulsed low energy electron sources (100-1000 ns; 1.0-50.0 keV) are investigated for the modification of surface properties of materials. The first design uses a plasma formed on a dielectric, which is excited by a high-frequency pulse generator. The second uses a microchannel plate to form the cathode plasma. Experimental results are presented on the formation of pulsed high-current, low-energy electron beams with large cross-sectional area. The experimental data are analyzed for time stability and current density uniformity.
Keywords :
cathodes; microchannel plates; plasma materials processing; surface treatment; cathode plasma; current density uniformity; electron volt energy 1.0 keV to 50.0 keV; high-frequency pulse generator; material surface modification; microchannel plate; pulsed low energy electron sources; time 100 ns to 1000 ns; time stability; Cathodes; Dielectric materials; Electron sources; Microchannel; Plasma density; Plasma materials processing; Plasma properties; Plasma sources; Plasma stability; Pulse generation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2007. ICOPS 2007. IEEE 34th International Conference on
Conference_Location :
Albuquerque, NM
ISSN :
0730-9244
Print_ISBN :
978-1-4244-0915-0
Type :
conf
DOI :
10.1109/PPPS.2007.4345465
Filename :
4345465
Link To Document :
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