• DocumentCode
    1614127
  • Title

    Development of High Power Pulse Micro-Plasma Source

  • Author

    Miyahara, Hidekazu ; Kumagai, Wataru ; Watanabe, Masato ; Hotta, Eiki ; Okino, Akitoshi

  • Author_Institution
    Tokyo Tech, Tokyo
  • fYear
    2007
  • Firstpage
    177
  • Lastpage
    177
  • Abstract
    Summary form only given. Application of atmospheric plasma for industrial purpose widely spread because it dose not need vacuum chamber and pumping system. In various atmospheric plasmas, microplasma sources attract attention. Because it has a large potential for small area and low cost processing. In this study, we designed and developed a new high power pulse microplasma source. The new hollow cathode type plasma source has metal-insulator-metal structure with small discharge hole. Molybdenum plates that have 300 mum thickness are used as electrodes and a glass plate that has 900 mum thickness is used as an insulator. An atmospheric plasma is stably generated in the small hole. However, the electron number density and the plasma temperature are limited by small input power (~ few W). The input power is limited by electrode melting. To increase the input power, we developed a pulsed power generator. The discharge waveform has high voltage predischarge pulse and long main pulse. The previous pulse is used for ignite the pre-plasma and latter pulse is used to maintain the stable plasma. The basic properties of the plasma that includes emission intensity and some plasma temperatures are reported.
  • Keywords
    cathodes; glow discharges; plasma density; plasma sources; plasma temperature; pulsed power supplies; atmospheric plasma; discharge hole; electrode melting; electron number density; emission intensity; glass plate; high power pulse microplasma source; high voltage predischarge pulse; hollow cathode; input power; long main pulse; low cost processing; metal-insulator-metal structure; molybdenum plates; plasma temperature; pulsed power generator; Costs; Electrodes; Plasma applications; Plasma materials processing; Plasma properties; Plasma sources; Plasma stability; Plasma temperature; Plasma waves; Vacuum systems;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2007. ICOPS 2007. IEEE 34th International Conference on
  • Conference_Location
    Albuquerque, NM
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-4244-0915-0
  • Type

    conf

  • DOI
    10.1109/PPPS.2007.4345483
  • Filename
    4345483