DocumentCode :
1615121
Title :
Implementation of MIMO R2R control regulation on furnaces processes
Author :
Richard, B. ; Roussy, A. ; Brun, L. ; Pompier, D. ; Alegret, C. ; Pinaton, J.
Author_Institution :
CMP- Georges Charpak, Ecole Nat. Super. des Mines de St.-Etienne, Gardanne, France
fYear :
2010
Firstpage :
143
Lastpage :
148
Abstract :
With geometries scaling down and the considerable multiplication of process recipes used in production for the same furnace, it becomes more and more difficult and hard to tune all process recipes correctly to achieve target deposition thickness performances. In this paper diffusion furnace recipes control using run to run (R2R) will be presented and described. The goal is to be able to control all furnace recipes using transfer models and corrective factors.
Keywords :
MIMO systems; chemical vapour deposition; furnaces; process control; LPCVD furnace; MIMO R2R control regulation; diffusion furnace recipe control; furnace processes; low pressure chemical vapor deposition; run to run control; Aging; Furnaces; Mathematical model; Predictive models; Process control; Temperature measurement; US Department of Energy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference (ASMC), 2010 IEEE/SEMI
Conference_Location :
San Francisco, CA
ISSN :
1078-8743
Print_ISBN :
978-1-4244-6517-0
Type :
conf
DOI :
10.1109/ASMC.2010.5551436
Filename :
5551436
Link To Document :
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