Title :
Defect Intelligent Sampling System
Author :
Lin, Chen-Ting ; Huang, Chin-Chang ; Yang, Chin-Yi ; Wu, Yao-Wen ; Lu, Chin-Sheng ; Tsai, Po-Yueh ; Huang, Chih-Mu ; Wang, Ying-Lang
Author_Institution :
Taiwan Semicond. Manuf. Co., Ltd., Tainan, Taiwan
Abstract :
This paper describes a new paradigm of defect sampling, the Defect Intelligent Sampling System (Defect-ISS), which introduces a far more effective in-line defect inspection and process control method in a diverse product and technology node mass production environment. Three important benefits are realized with the implementation of Defect-ISS: (1) Sampling stability (2) Satisfactory coverage of products in line (3) Comprehensive inclusion of the process tools.
Keywords :
image sampling; process control; defect intelligent sampling system; defect-ISS; in-line defect inspection; process control method; process tools; technology node mass production environment; Inspection; Mass production; Monitoring; Process control; Time frequency analysis;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference (ASMC), 2010 IEEE/SEMI
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-4244-6517-0
DOI :
10.1109/ASMC.2010.5551440
