Title :
8Gb 3D DDR3 DRAM using through-silicon-via technology
Author :
Kang, Uksong ; Chung, Hoe-Ju ; Heo, Seongmoo ; Ahn, Soon-Hong ; Lee, Hoon ; Cha, Soo-Ho ; Ahn, Jaesung ; Kwon, DukMin ; Kim, Jin Ho ; Lee, Jae-Wook ; Joo, Han-Sung ; Kim, Woo-Seop ; Kim, Hyun-Kyung ; Lee, Eun-Mi ; Kim, So-Ra ; Ma, Keum-Hee ; Jang, Dong-Hy
Author_Institution :
Samsung Electron., Hwasung, South Korea
Abstract :
DRAMs in modules are preferably arranged in multiple ranks to increase system band-width. However, this limits the input/output (I/O) speed since increased channel loading causes degradation in signal integrity. To overcome the I/O speed limit, several buffered module solutions have been proposed, where data pins are buffered by additional chips. However, this increases power consumption and latency significantly. We present a 3D DRAM with TSVs that overcomes the limits of conventional module approaches. Important architectural aspects, and key 3D technologies such as inter-rank seamless read scheme, TSV check and repair scheme, and a power-noise reduction method are presented.
Keywords :
DRAM chips; low-power electronics; 3D DDR3 DRAM; TSV check and repair scheme; TSV production; inter-rank seamless read scheme; low-power technology; power-noise reduction method; storage capacity 8 Gbit; through-silicon-via technology; Assembly; Circuit testing; Clocks; Delay; Interleaved codes; Master-slave; Noise reduction; Packaging; Random access memory; Through-silicon vias;
Conference_Titel :
Solid-State Circuits Conference - Digest of Technical Papers, 2009. ISSCC 2009. IEEE International
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-4244-3458-9
DOI :
10.1109/ISSCC.2009.4977342