Title :
Optimization of antireflective coatings to crystalline silicon solar cell
Author :
Yuan Li ; Xiaodong Lu ; Tao Zhou
Author_Institution :
New Energy Coll., Bohai Univ., Jinzhou, China
Abstract :
Based on varieties of dielectric film materials with different refractive rate, this paper has designed antireflective coatings to crystalline silicon solar cell front surface in transfer matrix method (TMM). The optical absorption effect showed by single, double, three layer antireflection coatings and the incident light with different angle of incidence are analyzed and evaluated. Results show that: when 360nm<;λ<;1200nm, among double layer dielectric film, the reflection loss of MgF2|Si3N4 double layer dielectric film is minimum; among three layer dielectric film, the MgF2|Al2O3|Si3N4 three layer dielectric film reflection loss is very low. In the three layer antireflection film structure and for different incident angles, the reflectivity of incident light can be reduced basically under 10%, and all regions of the spectrum absorption of the silicon material are made good use.
Keywords :
absorption; antireflection coatings; elemental semiconductors; silicon; solar cells; MgF2-Al2O3-Si3N4; TMM; antireflective coating optimization; crystalline silicon solar cell; dielectric film materials; double-antireflection coatings; double-layer dielectric film; front surface; incidence angle; incident light; incident light reflectivity; optical absorption effect; reflection loss; refractive rate; silicon material; single-antireflection coatings; spectrum absorption; three-layer antireflection coatings; three-layer antireflection film structure; transfer matrix method; Absorption; Coatings; Dielectric films; Photovoltaic cells; Reflection; Reflectivity; Silicon; antireflection coating; reflectivity; silicon solar cells;
Conference_Titel :
Chinese Automation Congress (CAC), 2013
Conference_Location :
Changsha
Print_ISBN :
978-1-4799-0332-0
DOI :
10.1109/CAC.2013.6775848