DocumentCode :
1615979
Title :
An integrated low-pass filter structure
Author :
Holten, Stephan ; Kliem, Herbert
Author_Institution :
Inst. of Electr. Eng. Phys., Saarland Univ., Saarbrucken, Germany
fYear :
2001
fDate :
6/23/1905 12:00:00 AM
Firstpage :
215
Lastpage :
218
Abstract :
Presented a novel method to prepare integrated low-pass MIS filters by evaporating a palladium gate electrode structure on a Si-SiO 2 substrate layer. The filter properties are achieved by structuring the gate electrode with areas of low-resistance contact pads and a high-resistance region. The high-resistance region with its clustered structure exhibits an anomalous temperature dependence for a metal. The resistivity follows an Arrhenius like thermally activated process. Gold electrode structures of the same geometrical dimensions show no measurable conductivity
Keywords :
MIS devices; MOS analogue integrated circuits; low-pass filters; palladium; silicon; silicon compounds; Arrhenius like thermally activated process; Si-SiO2-Pd; anomalous temperature dependence; clustered structure; gate electrode structure; geometrical dimensions; high-resistance region; low-pass filter structure; low-resistance contact pads; resistivity; Conductivity; Cutoff frequency; Electric resistance; Electrical resistance measurement; Electrodes; Fabrication; Low pass filters; Morphology; Palladium; Temperature dependence;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid Dielectrics, 2001. ICSD '01. Proceedings of the 2001 IEEE 7th International Conference on
Conference_Location :
Eindhoven
Print_ISBN :
0-7803-6352-3
Type :
conf
DOI :
10.1109/ICSD.2001.955597
Filename :
955597
Link To Document :
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