DocumentCode :
1616537
Title :
Studies of ammonia synthesis in a strong ionization discharge at ambient pressure
Author :
Bai, Mindong ; Zhang, Zhitao ; Han, Hui ; Wang, Yan ; Bai, Xiyao
Author_Institution :
Environ. Eng. Res. Inst., Dalian Maritime Univ., China
Volume :
2
fYear :
2001
Firstpage :
1103
Abstract :
The plasma synthesis of ammonia has been studied in nitrogen-hydrogen plasma using a strong ionization discharge at ambient pressure. With the new technology of dielectric barrier, the reduced field reaches 300 Td in the narrow discharge gap, and the electrons gain the average energy of 8 eV. At the same time, N/sub 2/ and H/sub 2/, molecules are ionized and dissociated and a large number of free atoms, ions and radicals are in nonequilibrium plasma after inelastic collisions. The final product was mainly ammonia including a small amount of hydrazine, and the yields of ammonia reaches 12500 ppm (1.25%). In this way, plasma synthesis of ammonia at ambient pressure is realized and a new method is provided for inorganic synthesis, which consumes little energy and simplifies the process.
Keywords :
ammonia; discharges (electric); dissociation; free radical reactions; ionisation; plasma chemistry; plasma collision processes; plasma materials processing; 8 eV; N/sub 2/-H/sub 2/; NH/sub 3/; ambient pressure; ammonia; ammonia synthesis; average energy; dielectric barrier; free atoms; free radicals; hydrazine; inelastic collisions; inorganic synthesis; ions; molecules dissociation; molecules ionisation; narrow discharge gap; nitrogen-hydrogen plasma; nonequilibrium plasma; plasma synthesis; reduced field; strong ionization discharge; Atomic measurements; Chemical technology; Dielectrics; Electrons; Ionization; Iron; Nuclear and plasma sciences; Plasma temperature; Radio frequency; Wires;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Industry Applications Conference, 2001. Thirty-Sixth IAS Annual Meeting. Conference Record of the 2001 IEEE
Conference_Location :
Chicago, IL, USA
ISSN :
0197-2618
Print_ISBN :
0-7803-7114-3
Type :
conf
DOI :
10.1109/IAS.2001.955616
Filename :
955616
Link To Document :
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