Influence of the defects on the I-V characteristics for LDD-nMOSFETs

Hot-carrier injection is observed increasingly to degrade the I-V characteristics with the scaling of MOS transistors. For the lightly doped drain (LDD) MOS transistor the injection of hot carriers, caused by the high electric field in the MOS structure, is localized in the LDD region. The modeling of the drain current in relation to defects due to the hot-carrier injection allows us to investigate the I-V characteristics and the transconductance of devices. Consequently, we can calculate the amount of device degradation caused by these defects in order to find technological solutions to optimize reliability.